Headway spin coater manual

This manual spinner has a new controller, the Headway model PWM32, which allows a bit of programming similar to our new CEE spinner. We can use the Headway for small samples because it has facilities more amenable to tiny samples. Headway Research, Inc. produces a line of spin coaters, spin developers for photoresist imaging, and spin cleaners. Our spinners, associated dispensers, and accessories are commonly used for RD and specialty production use. Headway's spinners rotate an object, and use the centrifugal force to spread a liquid across the surface. Uses include. The Headway Research ECD Spin Coater offers high acceleration, high torque, electronic speed regulation, automatic cycle and breaking to rotate small sample pieces, glass slides, and up to 4” diameter wafers to uniformly spread photoresist, polyamide, HMDS, SOG and spin on.

Manual Photoresist Spin Coater. Unit Price: Unstated: Number of Units: 1: Manufacturer: Headway: Model: PWMBD5-CB Headway Manual Spin Coater: This Headway system is used is spin coat liquid materials, solutions or suspensions. The spindle is controlled manually using the installed rotational tachometer. Up to 4" substrates can be processed. Working: Sarah An: Headway Spin Coater: The Headway spin coater uses centrifugal force to uniformly coat fluids. Headway Research, Inc. produces a line of spin coaters, spin developers for photoresist imaging, and spin cleaners. Our spinners, associated dispensers, and accessories are commonly used for RD and specialty production use. Headway's spinners rotate an object, and use the centrifugal force to spread a liquid across the surface. Uses include.

Headway Research PWMPS Programmable Spin Coater. PS Motor: Up to 10, rpm, for relatively light loads such as silicon wafers, small photomasks, etc. CB15 Bowl: inch I.D., reduced by a removable splash deflector (inch opening) to a maximum recommended substrate dimension of 12 inches. For smaller substrates, the standard splash. The Headway Coater is used to manually apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time substrate and fluid properties of the photoresist determine the final thickness of the film. Headway Research, Inc. produces a line of spin coaters, spin developers for photoresist imaging, and spin cleaners. Our spinners, associated dispensers, and accessories are commonly used for RD and specialty production use. Headway's spinners rotate an object, and use the centrifugal force to spread a liquid across the surface. Uses include.